Unmatched insight into symmetry-dependent physical properties of matter.

Optimized process control for improved quality, reliability, and efficiency.

Faster research cycles, accelerated optimization, and reduced costs.

Laser-Optical Second Harmonic Generation

The performance of thin‐film‐based devices is critically dependent on material composition, design parameters, and growth conditions. Understanding and optimizing these factors is complex and tedious. Until now, the characterization of functional thin-film properties such as an electric polarization or a magnetization is typically performed after completing the deposition and outside of the growth environment.

3Wave provides fast, contactless, non-invasive, and non-destructive access to functional material properties in real time, while thin-film structures are growing or processed in the deposition chamber. The functional properties are accessed through the effect they have on the symmetry of the material. This symmetry is probed with high sensitivity by laser-optical frequency doubling, also called second harmonic generation (SHG). The observation of a certain SHG contribution indicates presence of a specific functionality – offering instant feedback for precise growth optimization.

Just as reflection high-energy electron diffraction (RHEED) has revolutionized in-situ access to the topography, in-situ SHG (ISHG) is envisaged to revolutionize access to and control of functional and application-relevant properties during the growth of epitaxial thin films or multilayer heterostructures.

3Wave relies on the strong expertise gained during more than a decade of ISHG research in the Laboratory for Multifunctional Ferroic Materials at ETH Zurich. After these investigations have led to many breakthrough publications in the field of oxide electronics, ISHG now becomes available as an affordable and compact tool, ready to drive the development of functional materials in application-orientated research laboratories around the world.

Key Features

  • Real-time, non-destructive monitoring of bulk, surface, and interface properties
  • Direct, immediate probing of the influence of thickness, temperature, gas pressure, and other growth parameters on the thin-film or heterostructure properties
  • User-friendly and intuitive software for seamless operation and data analysis

Benefits

  • Unmatched insight into symmetry-dependent physical properties of matter
  • Optimized process control for improved quality, reliability, and efficiency
  • Faster research cycles, accelerated optimization, and reduced costs

EXCITATION UNIT (XU): Powerful Laser with Extensive Parameter Control

Integrated laser optics enable power adjustment, full linear polarisation rotation and four-dimensional beam-pointing control. Live camera feedback, eye-safe alignment tools, and a flexible focus setting ensure reliable and reproducible results in demanding experiments.

DETECTION UNIT (DU): Signal Filtering and High-Sensitivity Acquisition

Sophisticated filtering schemes, high-speed photodetection and advanced digital processing ensure the background-free detection of even the tiniest SHG responses from crystal films of only a few nanometer thickness. Alignment features facilitate a smooth workflow.

SMART SOFTWARE: Full Setup Control and Assisted Data Processing

Delivered as a complete, fully integrated experiment platform, the system’s hardware and software are engineered to work in harmony. Purpose-built for scientific workflows, the software combines experiment control, real-time visualization, and advanced analysis in a single interface. From initialization and alignment to final data evaluation, every step is guided and managed. Integrated analysis tools deliver immediate insights, eliminate inefficient detours to third-party tools, and accelerate your path to discovery.

MOUNTING OPTIONS: Chamber Integration of our EXCITATION- and DETECTION-UNIT

Seamless mounting onto virtually any growth or processing chamber — standard CF63 interface with adapter options ensure fast installation and upgrade with maximum flexibility and compatibility.

For further details, kindly fill out the contact form.

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3Wave Instruments AG

c/o ETH Zurich, Department of Materials Laboratory for Multifunctional Ferroic Materials
Vladimir-Prelog-Weg 4, HCI E 486.2
8093 Zurich, Switzerland

info@3Wave-Instruments.ch